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Tin Oxide- Sputtering Target Purity:>=99.96% which prevents electron charge-up artifacts
Tin Oxide- Sputtering Target Purity:>=99.96% which prevents electron charge-up artifacts
Tin Oxide- Sputtering Target Purity:>=99.96% which prevents electron charge-up artifacts
Tin Oxide- Sputtering Target Purity:>=99.96% which prevents electron charge-up artifacts

Tin Oxide- Sputtering Target Purity:>=99.96% which prevents electron charge-up artifacts

SKU: 55685006510

4.1
USD237.50 USD264.50

Pay in 4 interest-free payments of $59.38 Learn more

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Ships within 48 hours · Estimated delivery Sep 1 - Sep 6

Live Spec

Tin Oxide- Sputtering Target Purity:>=99.96% which prevents electron charge-up artifactsHigh purity, low cost standard round Tin Oxide Sputter Targets * ~90% density * Low gas content * Dense and homogeneous * Small, uniform grains <100um Contact Us : Request for Custom Sizes & Target Bonding services

Store: kentjenerator.com · Domain: kentjenerator.com

Description

which prevents electron charge-up artifacts during  SEM imaging and analysis

low cost Calcium Mangante (CaMnO3) Sputter Targets

low cost standard round Titanium Oxide- black Sputter Targets

99%) Niobium oxide granules for electron beam or thermal Evaporation

No returns please

Tin Oxide- Sputtering Target Purity:>=99.96% which prevents electron charge-up artifactsHigh purity, low cost standard round Tin Oxide Sputter Targets * ~90% density * Low gas content * Dense and homogeneous * Small, uniform grains <100um Contact Us : Request for Custom Sizes & Target Bonding services

Exchange/Return Notes
  • We offer a 30-day return/exchange service after receiving.
  • Final sale items are not eligible for returns or exchanges.
  • To process your return/exchange, please contact us at [email protected]
  • Please click here for more details>>> Return & Exchange Policy

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